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Issue DateTitleAuthor(s)TypeAccess
12001Mechanical and surface analysis of Ti0.4Al0.6N/Mo multilayersTavares, C. J. ; Rebouta, L. ; Andritschky, M. ; Guimarães, F. ; Cavaleiro, A. articleopenAccess
22001Microstructure and mechanical properties of nanocomposite (Ti,Si,Al)N coatingsCarvalho, S. ; Rebouta, L. ; Cavaleiro, A. ; Rocha, L. A. ; Gomes, J. ; Alves, E. articleopenAccess
32000Characterisation of Ti1-xSixNy nanocomposite filmsVaz, F. ; Rebouta, L. ; Goudeau, P. ; Pacaud, J. ; Garem, H. ; Rivière, J. P. ; Cavaleiro, A. ; Alves, E. articleopenAccess
42000A structural and mechanical analysis on PVD-grown (Ti,Al)N/Mo multilayersTavares, C. J. ; Rebouta, L. ; Alves, E. ; Cavaleiro, A. ; Goudeau, P. ; Rivière, J. P. ; Declemy, A. articleopenAccess
52001Elastic properties of (Ti,Al,Si)N nanocomposite filmsCarvalho, S. ; Vaz, F. ; Rebouta, L. ; Schneider, D. ; Cavaleiro, A. ; Alves, E. articleopenAccess
62004Microstructure, mechanical properties and cutting performance of superhard (Ti,Si,Al)N nanocomposite films grown by d.c. reactive magnetron sputteringCarvalho, S. ; Ribeiro, E. ; Rebouta, L. ; Tavares, C. ; Mendonça, J. P. ; Monteiro, A. Caetano ; Carvalho, N. J. M. ; Hosson, J. Th. M. De ; Cavaleiro, A. articleopenAccess
72005Structural stability of decorative ZrNxOy thin filmsCarvalho, P. ; Vaz, F. ; Rebouta, L. ; Carvalho, S. ; Cunha, L. ; Goudeau, Ph. ; Rivière, J. P. ; Alves, E. ; Cavaleiro, A. articleopenAccess
82003Effects of the morphology and structure on the elastic behavior of (Ti,Si,Al)N nanocompositesCarvalho, S. ; Ribeiro, E. ; Rebouta, L. ; Vaz, F. ; Alves, E. ; Schneider, D. ; Cavaleiro, A. articleopenAccess
92006Structural evolution in ZrNxOy thin films as a function of temperatureCunha, L. ; Vaz, F. ; Moura, C. ; Rebouta, L. ; Carvalho, P. ; Alves, E. ; Cavaleiro, A. ; Goudeau, Ph. ; Rivière, J. P. articleopenAccess
101998Physical and mechanical properties of Ti1 - xSixN filmsVaz, F. ; Rebouta, L. ; Ramos, S. ; Cavaleiro, A. ; Silva, M. F. da ; Soares, J. C. articleopenAccess
112004Property change in ZrNxOy thin films: effect of the oxygen fraction and bias voltageVaz, F. ; Carvalho, P. ; Cunha, L. ; Rebouta, L. ; Moura, C. ; Alves, E. ; Ramos, A. R. ; Cavaleiro, A. ; Goudeau, Ph. ; Rivière, J. P. articleopenAccess
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