Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/4236
Title: Structural stability of decorative ZrNxOy thin films
Authors: Carvalho, P. 
Vaz, F. 
Rebouta, L. 
Carvalho, S. 
Cunha, L. 
Goudeau, Ph. 
Rivière, J. P. 
Alves, E. 
Cavaleiro, A. 
Keywords: Sputtering; Zirconium nitride; Thermal degradation
Issue Date: 2005
Citation: Surface and Coatings Technology. 200:1-4 (2005) 748-752
Abstract: ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 °C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10 < fO2 < 0.22) showed no significant changes in hardness after thermal annealing at 800 °C. For intermediate and high oxygen fractions, an initial decrease in hardness at 600 °C annealing is followed by an inversion at the highest temperatures (700 and 800 °C, respectively), resulting from possible oxide phases crystallization, defect annealing at high temperatures and some extended phase segregations. The increase in the oxygen fraction is followed by a decrease of hardness in the as-deposited samples towards the values of "pure" ZrO2. No significant changes in colour were observed with the annealing.
URI: http://hdl.handle.net/10316/4236
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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