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https://hdl.handle.net/10316/4236
Título: | Structural stability of decorative ZrNxOy thin films | Autor: | Carvalho, P. Vaz, F. Rebouta, L. Carvalho, S. Cunha, L. Goudeau, Ph. Rivière, J. P. Alves, E. Cavaleiro, A. |
Palavras-chave: | Sputtering; Zirconium nitride; Thermal degradation | Data: | 2005 | Citação: | Surface and Coatings Technology. 200:1-4 (2005) 748-752 | Resumo: | ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 °C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10 < fO2 < 0.22) showed no significant changes in hardness after thermal annealing at 800 °C. For intermediate and high oxygen fractions, an initial decrease in hardness at 600 °C annealing is followed by an inversion at the highest temperatures (700 and 800 °C, respectively), resulting from possible oxide phases crystallization, defect annealing at high temperatures and some extended phase segregations. The increase in the oxygen fraction is followed by a decrease of hardness in the as-deposited samples towards the values of "pure" ZrO2. No significant changes in colour were observed with the annealing. | URI: | https://hdl.handle.net/10316/4236 | DOI: | 10.1016/j.surfcoat.2005.02.100 | Direitos: | openAccess |
Aparece nas coleções: | FCTUC Eng.Mecânica - Artigos em Revistas Internacionais |
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filed9deeba0a0744d389cf19d071d047cd0.pdf | 149.53 kB | Adobe PDF | Ver/Abrir |
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