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Title: Physical and mechanical properties of Ti1 - xSixN films
Authors: Vaz, F. 
Rebouta, L. 
Ramos, S. 
Cavaleiro, A. 
Silva, M. F. da 
Soares, J. C. 
Keywords: Rutherford back-scattering spectrometry; Silicon; Titanium; X-ray diffraction
Issue Date: 1998
Citation: Surface and Coatings Technology. 100-101:(1998) 110-115
Abstract: Ti1 - xSixN coatings with 0 <- x <- 0.30 and thicknesses ranging from 1.2 to 3.3 [mu]m, were deposited on to polished high-speed steel substrates by r.f. reactive magnetron sputtering. The atomic composition of the samples was measured by Rutherford backscatering spectrometry (RBS), and the texture was determined by X-ray diffraction (XRD). Great improvements in hardness and adhesion behaviour were obtained when compared to TiN. Hardness results and adhesion behaviour as a function of the Si content will be shown and discussed. The Ti0.85Si0.15N sample presented the best results with a hardness value of about 36 GPa and a critical load for total failure around 70 N.
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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