Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/27181
Title: Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering
Authors: Reddy, A. Sivasankar 
Figueiredo, N. M. 
Cavaleiro, A. 
Keywords: A. Oxides; A. Thin films; C. X-ray diffraction
Issue Date: Jun-2013
Publisher: Elsevier
Citation: REDDY, A. Sivasankar; FIGUEIREDO, N. M.; CAVALEIRO, A. - Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering. "Journal of Physics and Chemistry of Solids". ISSN 0022-3697. Vol. 74 Nº. 6 (2013) p. 825-829
Serial title, monograph or event: Journal of Physics and Chemistry of Solids
Volume: 74
Issue: 6
Abstract: Influence of annealing temperature on structural, compositional, surface morphology, electrical, and optical properties of pulsed magnetron sputtered nanocrystalline Au:Ag:SnO2 films was investigated by several analytical techniques. From the XRD results, the films were polycrystalline with the absence of impurity phases and the films were grown preferentially in the (110) orientation of SnO2 with tetragonal structure. The surface smoothness and grain size of the films increases with annealing temperature. Photoluminescence measurements show that the as deposited Au:Ag:SnO2 films exhibited a broad emission peak at 536 nm (2.31 eV). The lowest electrical resistivity of 0.005 Ω cm was obtained at the films annealed at 500 °C. The optical studies show that the visible transmittance and band gap of the films increases with annealing temperature.
URI: http://hdl.handle.net/10316/27181
ISSN: 0022-3697
DOI: 10.1016/j.jpcs.2013.01.023
Rights: openAccess
Appears in Collections:I&D CEMUC - Artigos em Revistas Internacionais
FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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