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Title: Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode
Authors: Ferreira, Fábio 
Cavaleiro, Albano 
Oliveira, João 
Keywords: HiPIMS; deep oscillation magnetron sputtering (DOMS); Ta; bias
Issue Date: 2020
Publisher: MDPI
Project: UIDB/00285/2020 
HardRings (AAC n. 02/SAICT/2017, projeto n. 29122) 
Serial title, monograph or event: Metals
Volume: 10
Issue: 12
Abstract: The influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique, with substrate biasing was used. The substrate biasing was varied between 0 and 􀀀120 V. In this work, the structure (XRD), microstructure (SEM), surface morphology (AFM) and hardness, and Young’s modulus (nanoindentation) of the coatings were characterized. The results show with the use of such conditions it was possible to deposit a pure -Ta (the most desired at industrial level) with improved mechanical properties (hardness equal to 22.4 GPa and Young’s modulus equal to 235 GPa). The roughness of the Ta coatings decreases up to values of about 1 nm with an increase of substrate biasing. It was possible to deposit very dense Ta coatings with 2 m of thickness. Therefore, these results are significantly di erent than in previous works, o ering Ta coatings with a combination of very interesting properties.
ISSN: 2075-4701
DOI: 10.3390/met10121618
Rights: openAccess
Appears in Collections:I&D CEMMPRE - Artigos em Revistas Internacionais

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