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Title: Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar + Ne Plasmas
Authors: Oliveira, João 
Ferreira, Fábio 
Serra, Ricardo 
Kubart, Tomas 
Vitelaru, Catalin
Cavaleiro, Albano 
Keywords: HiPIMS; DLC; Ne; plasma analysis
Issue Date: 2020
Publisher: MDPI
Project: UIDB/00285/2020 
HardRings (AAC n 02/SAICT/2017, project n 29122) 
M-ERA Net project TANDEM through the Romanian Research and Innovation Ministry 
UEFISCDI project No 56/2016 
PROINSTITUTIO Project No. 19PFE/17.10.2018 
Serial title, monograph or event: Coatings
Volume: 10
Issue: 10
Abstract: Recently, the use of Ne as a processing gas has been shown to increase the ionization degree of carbon in High Power Impulse Magnetron Sputtering (HiPIMS) plasmas. In this work, time-resolved measurements of the substrate’s current density were carried out in order to study the time evolution of the ionic species arriving at the growing film. The addition of Ne to the plasma resulted in a steep increase of the sp3/sp2 ratio in the films once the Ne contents in the processing atmosphere exceeded 26%. Increasing the Ne content is shown to increase both the total number of C ions generated in the plasmas and the ratio of C/gaseous ions. The time-resolved substrate ion current density was used to evaluate the possibility of substrate biasing synchronizing with the discharge pulses in the HiPIMS process. It is shown that in pure Ar plasmas, substrate biasing should be confined to the time interval between 25 and 40 s after the pulse starts, in order to maximize the C+/Ar+ ratio bombarding the substrate and minimize the formation of film stresses. However, Ne addition to the processing gas shortens the traveling time of the carbon species towards the substrate, reducing the separation between the gaseous and carbon ion arrival times.
ISSN: 2079-6412
DOI: 10.3390/coatings10100914
Rights: openAccess
Appears in Collections:I&D CEMMPRE - Artigos em Revistas Internacionais

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