Please use this identifier to cite or link to this item:
Title: Effects of O addition on the thermal behaviour of hard W-N sputtered coatings
Authors: Louro, C. 
Oliveira, J. C. 
Cavaleiro, A. 
Keywords: Tungsten oxynitride; Sputtering; Thermal behaviour; HT-XRD; Hardness
Issue Date: 16-Jun-2009
Publisher: Elsevier Ltd.
Citation: Vacuum. 83:10 (2009) 1224-1227
Abstract: The structural thermal behaviour of three W-O-N sputtered coatings with similar metalloid to metal ratio (~2.1) was investigated up to 900 °C after annealing in a vacuum tube furnace as well as in-situ HT-XRD under a controlled atmosphere of Ar-5%H2. The as-deposited microstructure of the coatings consisting in a nanocomposite of low-order W-O and W-N phases evaluated differently as a function of the oxygen content. The W-O-N film containing more than 27 at.% O delaminated severely from the steel substrates for temperatures as low as 500 °C. In opposite, for the coatings with less O content, the low range order of the as-deposited structure was maintained up to 800 °C and with further annealing crystallized into a mixture of WO2 and W2N. The thermal behaviour of the oxynitride films overcame that observed for oxygen-free nitride ones. This is due to the greater N content retaining during annealing treatment, in opposite to the W-N films which give rise to the single metallic [alpha]-W phase. The structural and compositional evolution supported the hardness behaviour obtained by the thermal treatment in protective ambiance
ISSN: 0042-207X
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

Files in This Item:
File Description SizeFormat
Effects of O addition on the thermal behaviour.pdf489.79 kBAdobe PDFView/Open
Show full item record

Page view(s) 50

checked on Oct 16, 2019


checked on Oct 16, 2019

Google ScholarTM


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.