Please use this identifier to cite or link to this item:
https://hdl.handle.net/10316/4218
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Silva, C. W. Moura e | - |
dc.contributor.author | Branco, J. R. T. | - |
dc.contributor.author | Cavaleiro, A. | - |
dc.date.accessioned | 2008-09-01T10:44:07Z | - |
dc.date.available | 2008-09-01T10:44:07Z | - |
dc.date.issued | 2006 | en_US |
dc.identifier.citation | Thin Solid Films. 515:3 (2006) 1063-1068 | en_US |
dc.identifier.uri | https://hdl.handle.net/10316/4218 | - |
dc.description.abstract | In this paper, W-doped C-based coatings were deposited on steel and silicon substrates by RF magnetron sputtering, using W and C targets, varying the cathode power applied to the W target and the substrate bias. The chemical composition was varied by placing the substrates in a row facing the C and W targets. W content in the films increased from 1 to 2 at.% over the C target to ~ 73 at.% over the W target. The coatings with W content lower than ~ 12 at.% and ~ 23 at.%, for biased and unbiased conditions, respectively, showed X-ray amorphous structures, although carbide nanocrystals must exist as shown by the detection of the WC1-x phase in films with higher W content. C-rich films were very dense and developed a columnar morphology with increasing W content. An improvement in the hardness (from 10 GPa, up to 25 GPa) of the films was achieved either when negative substrate bias was used in the deposition, or when the WC1-x phase was detected by X-ray diffraction. The adhesion of the coatings is very low with spontaneous spallation of those deposited with negative substrate bias higher than 45 V. Varieties in cathode power (90 W or 120 W) applied to the W target showed no observable influence on the characteristics of the films. | en_US |
dc.description.uri | http://www.sciencedirect.com/science/article/B6TW0-4KXVCT6-6/1/a285b093ad366f2b40c4eb884a4442c6 | en_US |
dc.format.mimetype | aplication/PDF | en |
dc.language.iso | eng | eng |
dc.rights | openAccess | eng |
dc.subject | W-doped DLC | en_US |
dc.subject | C-based coatings | en_US |
dc.subject | Co-sputtering | en_US |
dc.subject | Mechanical properties | en_US |
dc.title | Characterization of magnetron co-sputtered W-doped C-based films | en_US |
dc.type | article | en_US |
item.fulltext | Com Texto completo | - |
item.openairecristype | http://purl.org/coar/resource_type/c_18cf | - |
item.grantfulltext | open | - |
item.languageiso639-1 | en | - |
item.openairetype | article | - |
item.cerifentitytype | Publications | - |
crisitem.author.researchunit | CEMMPRE - Centre for Mechanical Engineering, Materials and Processes | - |
crisitem.author.orcid | 0000-0001-8251-5099 | - |
Appears in Collections: | FCTUC Eng.Mecânica - Artigos em Revistas Internacionais |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
filee1fefcba7b1f4e82bdf75aab2dadf9c4.pdf | 1.13 MB | Adobe PDF | View/Open |
Google ScholarTM
Check
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.