Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/4290
Title: Nanocrystalline structure and hardness of thin films
Authors: Cavaleiro, A. 
Louro, C. 
Keywords: W-Si-N coatings; Hardness; Nanostructure; Sputtering
Issue Date: 2002
Citation: Vacuum. 64:3-4 (2002) 211-218
Abstract: W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.
URI: http://hdl.handle.net/10316/4290
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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