Please use this identifier to cite or link to this item: https://hdl.handle.net/10316/4235
DC FieldValueLanguage
dc.contributor.authorGalvan, D.-
dc.contributor.authorPei, Y. T.-
dc.contributor.authorHosson, J. Th. M. De-
dc.contributor.authorCavaleiro, A.-
dc.date.accessioned2008-09-01T10:44:25Z-
dc.date.available2008-09-01T10:44:25Z-
dc.date.issued2005en_US
dc.identifier.citationSurface and Coatings Technology. 200:1-4 (2005) 739-743en_US
dc.identifier.urihttps://hdl.handle.net/10316/4235-
dc.description.abstractElectron energy loss spectroscopy (EELS) in a transmission electron microscope (TEM) was employed to estimate the sp3 C content in magnetron sputtered H-free a-C coatings. The deconvolution procedure developed reduces considerably the error which is due to beam point spread function and sample thickness. The methodology has been applied to thin a-C films deposited through RF magnetron sputtering, and determined that, under the present values of ion current to the substrates (< 1 mA/cm2), a variation in energy of the upcoming ions (achieved through a variation in applied substrate bias) has a negligible influence on the C atoms hybridization.en_US
dc.description.urihttp://www.sciencedirect.com/science/article/B6TVV-4FRJM05-B/1/80f13f58505277c1e189b28d9bafa1c3en_US
dc.format.mimetypeaplication/PDFen
dc.language.isoengeng
dc.rightsopenAccesseng
dc.subjectsp3/sp2en_US
dc.titleDetermination of the sp3 C content of a-C films through EELS analysis in the TEMen_US
dc.typearticleen_US
dc.identifier.doi10.1016/j.surfcoat.2005.02.071-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.openairetypearticle-
item.cerifentitytypePublications-
item.grantfulltextopen-
item.fulltextCom Texto completo-
item.languageiso639-1en-
crisitem.author.researchunitCEMMPRE - Centre for Mechanical Engineering, Materials and Processes-
crisitem.author.orcid0000-0001-8251-5099-
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais
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