Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/4224
Title: Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings
Authors: Parreira, N. M. G. 
Carvalho, N. J. M. 
Cavaleiro, A. 
Keywords: Tungsten oxide; Reactive sputtering; Structural properties; Mechanical properties
Issue Date: 2006
Citation: Thin Solid Films. 510:1-2 (2006) 191-196
Abstract: Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the films (investigated by X-ray diffraction) depends on their oxygen content. For low oxygen contents, the [alpha]-W and [beta]-W3O phases were observed (< 30 at.%), and with the increase of oxygen content (30 at.% < O < 67 at.%) the structure became amorphous. A transition region was obtained for oxygen content between 67 at.% and 75 at.%, and when O > 75 at.%, a nanocrystalline (WO3) structure was reached.
URI: http://hdl.handle.net/10316/4224
Rights: openAccess
Appears in Collections:FCTUC Eng.Mecânica - Artigos em Revistas Internacionais

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