Please use this identifier to cite or link to this item: http://hdl.handle.net/10316/24817
DC FieldValueLanguage
dc.contributor.authorReddy, A. Sivasankar-
dc.contributor.authorFigueiredo, N. M.-
dc.contributor.authorCavaleiro, A.-
dc.date.accessioned2013-12-27T17:02:17Z-
dc.date.available2013-12-27T17:02:17Z-
dc.date.issued2012-09-
dc.identifier.citationREDDY, A. Sivasankar; FIGUEIREDO, N. M.; CAVALEIRO, A. - Pulsed direct current magnetron sputtered nanocrystalline tin oxide films. "Applied Surface Science". ISSN 0169-4332.258:22 (2012) 8902-8907por
dc.identifier.issn0169-4332-
dc.identifier.urihttp://hdl.handle.net/10316/24817-
dc.description.abstractThe nanocrystalline tin oxide (SnO2) films were deposited on glass substrates by pulsed magnetron sputtering technique and subsequently annealed from 200 to 500 °C. The structural, microstructural, electrical, and optical properties of as deposited and annealed SnO2 films were studied. The crystallinity degree of the films increased with annealing temperature. Photoluminescence (PL) measurements showed that the emission peaks have low intensity and are positioned at 535 nm (2.31 eV) and 605 nm (2.05 eV) in as deposited SnO2 films. The intensity of PL peak increases sharply with the increasing of annealing temperature. The as deposited films exhibited high electrical resistivity and low optical transmittance. After annealing at 500 °C, the electrical resistivity of the films decreased to the lowest value of 0.015 Ω cm, being the optical transmittance 90%.por
dc.language.isoengpor
dc.publisherElsevierpor
dc.rightsopenAccesspor
dc.subjectOxidespor
dc.subjectThin filmspor
dc.subjectSputteringpor
dc.subjectElectricalpor
dc.subjectOpticalpor
dc.titlePulsed direct current magnetron sputtered nanocrystalline tin oxide filmspor
dc.typearticlepor
degois.publication.firstPage8902por
degois.publication.lastPage8907por
degois.publication.issue22por
degois.publication.titleApplied Surface Sciencepor
dc.relation.publisherversionhttp://www.sciencedirect.com/science/journal/01694332por
dc.peerreviewedYespor
dc.identifier.doi10.1016/j.apsusc.2012.05.112-
degois.publication.volume258por
item.fulltextCom Texto completo-
item.languageiso639-1en-
item.grantfulltextopen-
Appears in Collections:I&D CEMUC - Artigos em Revistas Internacionais
FCTUC Eng.Mecânica - Artigos em Revistas Internacionais
Files in This Item:
File Description SizeFormat
Pulsed direct current magnetron sputtered.pdf579.7 kBAdobe PDFView/Open
Show simple item record

SCOPUSTM   
Citations

14
checked on Feb 18, 2020

WEB OF SCIENCETM
Citations

10
checked on May 29, 2020

Page view(s)

186
checked on Aug 6, 2020

Download(s)

231
checked on Aug 6, 2020

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.